| 张雪峋,刘奉妍.电解抛光工艺参数对钨表面形貌和表面粗糙度的影响[J].有色金属材料与工程,2022,43(1):18-26. |
| 电解抛光工艺参数对钨表面形貌和表面粗糙度的影响 |
| Effect of electro-polishing process parameters on surface morphology and surface roughness of tungsten |
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| DOI：10.13258/j.cnki.nmme.2022.01.003 |
| 中文关键词: 钨 电解抛光 工艺参数 表面形貌 表面粗糙度 |
| 英文关键词:tungsten electro-polishing process parameters micro-morphology surface roughness |
| 基金项目:上海市自然科学基金资助项目（15ZR1428300） |
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| 中文摘要: |
| 采用硫酸–甲醇–二水合柠檬酸钠电解质溶液体系对钨进行电解抛光。抛光液中硫酸与甲醇的体积比为1∶7，二水合柠檬酸钠浓度为0.25 mol/L。改变抛光电压、温度及时间，探究了工艺参数对电解抛光钨的微观形貌和表面粗糙度的影响。用扫描电子显微镜（scanning electron microscope，SEM）和原子力显微镜（atomic force microscope，AFM）对电解抛光后的试样进行表征测试。研究结果表明，在电压、温度和时间分别为22 V、20 ℃和7 min时，试样具有最小的表面粗糙度和良好的表面形貌。 |
| 英文摘要: |
| Tungsten was electro-polished by sulfuric acid-methanol-sodium citrate dihydrate electrolyte solution. The volume ratio of sulfuric acid to methanol in the polishing solution was 1∶7, and the concentration of sodium citrate dihydrate was 0.25 mol/L. The effect of process parameters on the micro-morphology and surface roughness of electropolished tungsten was investigated by changing the polishing voltage, temperature and time. The electropolished samples were characterized by scanning electron microscope (SEM) and atomic force microscope (AFM). The results show that the sample has the minimum surface roughness and good surface morphology when the voltage, temperature and time are 22 V, 20 °C and 7 min, respectively. |
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