| 李鑫,邱名健,倪一鸣,刘明仁,王旭,吴渊,朱镕锋,王觅堂,张栋梁.PVP链长对CeO2抛光液分散性及CMP性能的影响研究[J].有色金属材料与工程,2026,47(3):19-27. |
| PVP链长对CeO2抛光液分散性及CMP性能的影响研究 |
| A study on the effect of PVP chain length on the dispersibility and CMP performance of CeO2 polishing slurry |
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| DOI：10.13258/j.cnki.nmme.20260324001 |
| 中文关键词: 纳米CeO2 PVP改性 悬浮分散性 表面粗糙度 CMP |
| 英文关键词:nano-CeO2 PVP modification suspension dispersibility surface roughness CMP |
| 基金项目:国家重点研发计划资助项目2023YFB3507100；内蒙古自治区科技重大专项2019ZD023；2021ZD0028 |
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| 中文摘要: |
| 本研究系统揭示聚乙烯吡咯烷酮（polyvinylpyrrolidone, PVP）分子链长（K17、K30、K60、K90）对纳米CeO2形貌、粒径、分散性及化学机械抛光（chemico-mechanical polishing, CMP）性能的调控规律。结果表明，PVP 链长与颗粒尺寸、分散稳定性呈非线性最优关系：短链K17配位位点不足、空间位阻弱，团聚抑制效果差；长链K90易发生分子缠绕，有效配位效率降低，悬浮稳定性下降；适中链长的K60改性效果最佳，CeO2粒径为163.46 nm，pH=10时Zeta电位达?10.54 mV，24 h悬浮分散性最优，显著改善颗粒团聚。CMP测试显示，K60改性CeO2材料去除率为283.33 nm/min，K9玻璃表面粗糙度低至1.004 nm，实现高去除率与低表面粗糙度协同提升。机制表明，PVP通过C=O与Ce3+配位并形成空间位阻抑制团聚，有效降低表面损伤。本研究为高性能CMP磨料的分子链调控与结构设计提供理论支撑。 |
| 英文摘要: |
| This study systematically reveals the mechanisms by which the molecular chain length of polyvinylpyrrolidone (PVP) (K17, K30, K60, K90) regulates the morphology, particle size, dispersibility and chemical mechanical polishing (CMP) performance of nano-CeO2. The results indicate that there is a non-linear optimal relationship between PVP chain length and particle size and dispersion stability: the short-chain K17 has insufficient coordination sites and weak steric hindrance, resulting in poor agglomeration suppression; the long-chain K90 is prone to molecular entanglement, resulting in reduced effective coordination efficiency and decreased suspension stability; the medium-chain K60 exhibits the best modification effect, with a CeO2 particle size of 163.46 nm, a zeta potential of ?10.54 mV at pH 10, and optimal suspension dispersibility over 24 h, significantly improving particle agglomeration. CMP testing revealed that the K60-modified CeO2 material achieved a removal rate of 283.33 nm/min, with the surface roughness of the K9 glass reduced to as low as 1.004 nm, demonstrating a synergistic improvement in both high removal rate and low surface roughness. The mechanism indicates that PVP coordinates with Ce3+ via C=O bonds to form steric hindrance, thereby inhibiting agglomeration and effectively reducing surface damage. This study provides theoretical support for the molecular chain regulation and structural design of high-performance CMP abrasives. |
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