| 陈立强,李伟,刘平,何代华,张柯,马凤仓,刘新宽,陈小红.(AlCrTiZrNb)N/Al2O3纳米多层膜的微观结构和力学性能研究[J].有色金属材料与工程,2021,42(1):10-16. |
| (AlCrTiZrNb)N/Al2O3纳米多层膜的微观结构和力学性能研究 |
| Study on Microstructure and Mechanical Properties of (AlCrTiZrNb)N/Al2O3 Nano-multilayer Film |
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| DOI：10.13258/j.cnki.nmme.2021.01.002 |
| 中文关键词: (AlCrTiZrNb)N/Al2O3纳米多层膜 磁控溅射 力学性能 |
| 英文关键词:(AlCrTiZrNb)N/Al2O3 nano-multilayer film magnetron sputtering mechanical properties |
| 基金项目:国家自然科学基金资助项目（51471110） |
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| 中文摘要: |
| 在单晶硅片基底上采用反应磁控溅射技术交替溅射AlCrTiZrNb靶与Al2O3靶，制备了不同厚度Al2O3层的(AlCrTiZrNb)N/Al2O3纳米多层膜。采用X射线衍射仪(X-ray diffraction，XRD)，高分辨率透射电子显微镜(high resolution transmission electron microscopes，HRTEM)，扫描电子显微镜(scanning electron microscope，SEM)以及纳米压痕测试仪对(AlCrTiZrNb)N/Al2O3纳米多层膜的微观结构、力学性能等进行表征。结果表明：当Al2O3层厚度小于0.8 nm时，Al2O3层在(AlCrTiZrNb)N层的模板效应下由非晶态转化为立方结构亚稳态，与(AlCrTiZrNb)N层之间形成共格界面外延生长结构；(AlCrTiZrNb)N/Al2O3纳米多层膜的弹性模量和硬度随着Al2O3层厚度的增加先增大后减小，当Al2O3层厚度为0.8 nm时达到最大值，分别为317.6 GPa和29.8 GPa；薄膜的结晶性良好，清晰的柱状晶结构贯穿整个调制周期。 |
| 英文摘要: |
| The (AlCrTiZrNb)N/Al2O3 nano-multilayer films with different thicknesses of Al2O3 layer were prepared on single crystal silicon wafer by reactive magnetron sputtering technique using AlCrTiZrNb and Al2O3 as targets alternately. X-ray diffractometer (XRD), high-resolution transmission electron microscope (HRTEM), scanning electron microscope (SEM) and nano-indentation tester were used to characterize the microstructures and mechanical properties of the (AlCrTiZrNb)N/Al2O3 nano-multilayer films. The experimental results show that, when the thickness of the Al2O3 layer is less than 0.8 nm, the Al2O3 layer transforms from amorphous state to metastable cubic structure under the template effect of (AlCrTiZrNb)N layer and forms coherent interface epitaxial growth structure with (AlCrTiZrNb)N layer. With the increase of the thickness of the Al2O3 layer, the elastic modulus and hardness of the (AlCrTiZrNb)N/Al2O3 nano-multilayer films first increase and then decrease. When the thickness of the Al2O3 layer is 0.8 nm, the elastic modulus and hardness of the (AlCrTiZrNb)N/Al2O3 nano-multilayer film are 317.6 GPa and 29.8 GPa, respectively. At this time, the thin film presents high crystallinity, and clear columnar crystal structure runs through the entire modulation period. |
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